Low Pressure Plasmas and Microstructuring Technology
- 732 pages
- 26 hours of reading
The book explores the critical role of plasma-supported processes in the semiconductor industry, detailing their evolution and significance over the past forty years. It highlights how these processes are integral to various stages of semiconductor manufacturing, from surface cleaning to etching, and discusses advancements that have enabled the treatment of substrates with increasingly fine specifications. Additionally, it addresses the impact of plasma technology on improving conventional materials, paving the way for new research and applications in diverse fields.
