Lothar Pfitzner Books

Organic airborne molecular contamination in semiconductor device manufacturing has gained importance in the last few years. Although studies on the influence of organic contamination on certain processes are available, many questions concerning critical levels, measuring and filtration techniques remain unanswered. The Proceedings of the Organic Contamination Workshop 2001 cover all the contributions presented. The topics focus on measuring organic contamination on silicon wafers, including desorption techniques. Measuring organic contaminants in air as well as outgassing from materials used in cleanrooms is another important topic. The correlation between compounds found on silicon, found in the air and outgassing from materials is drawn. Levels that are commonly found are given and the specific impact of certain compounds on manufacturing processes is discussed. The state-of-the-art in filtration techniques is presented as well as actual problems that have occured. Theoretical aspects of surface contamination as well as critical levels are reviewed.

Organic airborne molecular contamination in semiconductor device manufacturing has gained importance over the last few years. With steadily shrinking device geometries, with the introduction of highly sophisticated process technologies and new materials, the control of the wafer environment is of extreme importance. The advent of manufacturing technologies using minienvironments brings new solutions to these problems, but also raises new questions to be answered. A task force within SEMI Europe deals with standardization of test methods for determining levels of organic contamination and the assessment of contamination risks caused by minienvironments themselves. Analytical methods that have been developed recently are partly included in existing standards but also a series of new standards is in progress.