Statistical approaches to the inverse problem of scatterometry

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Opt-73: M.-A. Henn: Statistical Approaches to the Inverse Probelm of Scatterometry Engl., 92 S., 47 Abb., 13 Tab., ISBN 978-3-95606-063-2, 2013 € 16,50 In the present work statistical approaches to the inverse problem of scatterometry are discussed. Scatterometry is the dimensional characterization of periodic nanostructures as they are used in the manufacturing of lithographic masks. In contrast to direct imaging methods, such as electron microscopy, scatterometry is a non-imaging indirect measurement method. The critical dimensions (CDs) such as line widths and heights of the surface profile are determined from the measured light diffraction pattern.