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Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, crucial for silicon integrated circuit technology. It discusses the intricacies of ion-solid interactions, predicting ion ranges, and addressing lattice disorder. The text covers essential processes like shallow-junction formation and the innovative use of hydrogen ion beams for silicon slicing. Additionally, it explores topics such as ion-beam mixing, stresses, and sputtering, highlighting their significance in enhancing materials properties and performance.
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Ion Implantation and Synthesis of Materials, James W. Mayer, Michael Nastasi
- Language
- Released
- 2010
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- (Paperback)
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- Title
- Ion Implantation and Synthesis of Materials
- Language
- English
- Authors
- James W. Mayer, Michael Nastasi
- Publisher
- Springer Berlin Heidelberg
- Released
- 2010
- Format
- Paperback
- Pages
- 280
- ISBN13
- 9783642062599
- Category
- Nature in general
- Description
- Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, crucial for silicon integrated circuit technology. It discusses the intricacies of ion-solid interactions, predicting ion ranges, and addressing lattice disorder. The text covers essential processes like shallow-junction formation and the innovative use of hydrogen ion beams for silicon slicing. Additionally, it explores topics such as ion-beam mixing, stresses, and sputtering, highlighting their significance in enhancing materials properties and performance.